J.P. Krusius

Epitaxial growth and characterization of CaF2 on Si

L. J. Schowalter, R. W. Fathauer, Raymond P. Goehner et al. · Journal of Applied Physics · 1985 · 150 citations

Materials Science, Materials Engineering, Ionic Fluorite Crystal +14

Rapid thermal processing of thin gate dielectrics. Oxidation of silicon

J. Nulman, J.P. Krusius, A. Gat · IEEE Electron Device Letters · 1985 · 133 citations

Engineering, Oxidation Resistance, Thin Film Process Technology +16

Rapid thermal nitridation of thin thermal silicon dioxide films

J. Nulman, J.P. Krusius · Applied Physics Letters · 1985 · 32 citations

Materials Science, Gate Dielectrics, Electrical Engineering +15

Selective and anisotropic reactive ion etch of LPCVD silicon nitride with CHF3 based gases

T.C. Mele, J. Nulman, J.P. Krusius · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1984 · 30 citations

Materials Engineering, Materials Science, Chemical Engineering +15

The Fundamental Limits for Electronic Packaging and Systems

W.E. Pence, J.P. Krusius · IEEE Transactions on Components Hybrids and Manufacturing Technology · 1987 · 30 citations

Hardware Modeling, Engineering, Vlsi Design +19