B.A. Rashap

Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher

B.A. Rashap, Stéphane Lafortune, James Moyne et al. · IEEE Transactions on Semiconductor Manufacturing · 1995 · 73 citations

Engineering, Flow Control, Real-time Control Technology +20

Sensor systems for real-time feedback control of reactive ion etching

Tyrone Eugene Benson, Leonard I. Kamlet, Steve Ruegsegger et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 29 citations

Electrical Engineering, Sensor Systems, Engineering +14

Real-time feedback control of reactive ion etching

M.E. Elta, Julien Fournier, J.S. Freudenberg et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 21 citations

Electrical Engineering, Engineering, Flow Control +14

Nonlinear system identification and control of a reactive ion etcher

Tyrone L. Vincent, Pramod P. Khargonekar, B.A. Rashap et al. · 2005 · 21 citations

Nonlinear Control, Nonlinear System Identification, Reactive Ion Etcher +6

Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching

M.E. Elta, H. Etemad, J.S. Freudenberg et al. · 1993 · 19 citations

Electrical Engineering, Industrial Electronics, Engineering +13