Anton van Oosten

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

Electrical Engineering, Engineering, Specific Resistance +14

Application challenges with double patterning technology (DPT) beyond 45 nm

Jungchul Park, Stephen Hsu, Douglas Van Den Broeke et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 38 citations

Engineering, Electron-beam Lithography, Pattern Transfer +26

Development of layout split algorithms and printability evaluation for double patterning technology

Tsann-Bim Chiou, Robert Socha, Hong Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 38 citations

Pattern Split, Engineering, Electron-beam Lithography +19

Mask aspects of EUVL imaging at 27nm node and below

Natalia Davydova, Eelco van Setten, Sang-In Han et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 16 citations

Computed Tomography, Image Reconstruction, Optical Materials +23

Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning

Anton van Oosten, Peter Nikolsky, Judy Huckabay et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 15 citations

Source Separation, Engineering, Vlsi Design +21