Tsann-Bim Chiou

Development of layout split algorithms and printability evaluation for double patterning technology

Tsann-Bim Chiou, Robert Socha, Hong Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 38 citations

Pattern Split, Engineering, Electron-beam Lithography +19

Using intrafield high-order correction to achieve overlay requirement beyond sub-40nm node

Chun Huang, Chuei Fu Chue, An-Hsiung Liu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 19 citations

Full-chip pitch/pattern splitting for lithography and spacer double patterning technologies

Tsann-Bim Chiou, Robert Socha, Hoyoung Kang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 13 citations

Optimization of alignment/overlay sampling and marker layout to improve overlay performance for double patterning technology

Chuei-Fu Chue, Tsann-Bim Chiou, Chun-Yen Huang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 13 citations

Engineering, Electronic Design Automation, Computer Architecture +16

Nondestructive Evaluation of Composite Materials by ESPI

Wen‐Ching Wang, C.-H. Day, Chi-Hung Hwang et al. · Research in Nondestructive Evaluation · 1998 · 11 citations

Materials Science, Fibre-reinforced Plastic, Engineering +11