Judy Huckabay

Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning

Anton van Oosten, Peter Nikolsky, Judy Huckabay et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 15 citations

Source Separation, Engineering, Vlsi Design +21

Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20

Judy Huckabay, Wolf Staud, Robert J. Naber et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 14 citations

Engineering, Split Layouts, Computer-aided Design +21

Implementing self-aligned double patterning on non-gridded design layouts

Huixiong Dai, Jason Sweis, Chris Bencher et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 11 citations

Engineering, Vlsi Design, Computer Architecture +23

Physical and timing verification of subwavelength-scale designs: I. Lithography impact on MOSFETs

Robert C. Pack, Valery Axelrad, Andrei Shibkov et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 11 citations