Concepedia

G. C. Schwartz

GC

14

Publications

655

Citations

13

H-Index

1969

Active since

Affiliations

IBM (United States)(Current)

G. C. Schwartz is an author at IBM (United States) specializing in engineering, materials science, and surface science.

Top concepts

EngineeringMaterial ScienceApplied PhysicsSurface ScienceMicroelectronicsMaterials EngineeringThin FilmsMicrofabricationPhysicsElectrical Engineering

Publications per year

1969–1992

14

Publications

14

Reactive ion etching of silicon

G. C. Schwartz, Philipp Schaible · Journal of Vacuum Science and Technology · 1979 · 112 citations

Materials Science, Materials Engineering, Chemical Engineering +13

Mechanism of silicon etching by a CF4 plasma

J. L. Mauer, J. S. Logan, L. B. Zielinski et al. · Journal of Vacuum Science and Technology · 1978 · 98 citations

Materials Science, Engineering, Physics +13

Reactive Ion Etching of Copper Films

G. C. Schwartz, Philipp Schaible · Journal of The Electrochemical Society · 1983 · 79 citations

Materials Engineering, Materials Science, Engineering +7

Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Films Using Tetraethoxysilane and Oxygen: Characterization and Properties of Films

W. Patrick, G. C. Schwartz, J. Chapple-Sokol et al. · Journal of The Electrochemical Society · 1992 · 62 citations

Moisture Uptake, Engineering, Chip Wiring +18

Reactive ion etching induced corrosion of Al and Al-Cu films

Wen‐Yaung Lee, J. M. Eldridge, G. C. Schwartz · Journal of Applied Physics · 1981 · 55 citations

Materials Science, Materials Engineering, Corrosion Technology +11

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