J. M. Eldridge

Cobalt tetramethoxyphenyl porphyrin—emission Mossbauer spectroscopy and O2 reduction electrochemical studies

Daniel A. Scherson, Shiva Gupta, César A. Herreño-Fierro et al. · Electrochimica Acta · 1983 · 140 citations

Oxygen Reduction Reaction, Inorganic Chemistry, Chemical Engineering +8

Effects of Material and Processing Parameters on the Dielectric Strength of Thermally Grown SiO[sub 2] Films

Namsun Chou, J. M. Eldridge · Journal of The Electrochemical Society · 1970 · 84 citations · Full text

Engineering, Effective Breakdown Strength, Silicon On Insulator +16

Phosphosilicate glass stabilization of FET devices

P. Balk, J. M. Eldridge · Proceedings of the IEEE · 1969 · 63 citations

Materials Science, Glass-ceramic, Electrical Engineering +9

Reactive ion etching induced corrosion of Al and Al-Cu films

Wen‐Yaung Lee, J. M. Eldridge, G. C. Schwartz · Journal of Applied Physics · 1981 · 55 citations

Materials Science, Materials Engineering, Corrosion Technology +11

In situ and ex situ Moessbauer spectroscopy studies of iron phthalocyanine adsorbed on high surface area carbon

Daniel A. Scherson, S.B. Yao, Ernest Yeager et al. · The Journal of Physical Chemistry · 1983 · 48 citations

Materials Science, Inorganic Chemistry, Chemical Measurement +13