J. Chapple-Sokol

Polarization Effects of Fluorine on the Relative Permittivity in Polyimides

Gareth Hougham, G. Tesoro, Alfred Viehbeck et al. · Macromolecules · 1994 · 250 citations

Materials Science, Macromolecules 1994, Relative Permittivity +12

Gas-phase kinetics in the atmospheric pressure chemical vapor deposition of silicon from silane and disilane

Carmen J. Giunta, Richard J. McCurdy, J. Chapple-Sokol et al. · Journal of Applied Physics · 1990 · 71 citations

Chemical Engineering, Engineering, Larger Silanes +15

Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Films Using Tetraethoxysilane and Oxygen: Characterization and Properties of Films

W. Patrick, G. C. Schwartz, J. Chapple-Sokol et al. · Journal of The Electrochemical Society · 1992 · 62 citations

Moisture Uptake, Engineering, Chip Wiring +18

Kinetic Modeling of the Chemical Vapor Deposition of Silicon Dioxide from Silane or Disilane and Nitrous Oxide

Carmen J. Giunta, J. Chapple-Sokol, Roy G. Gordon · Journal of The Electrochemical Society · 1990 · 48 citations

Kinetic Modeling, Chemical Engineering, Nitrous Oxide +14

High Quality Plasma‐Enhanced Chemical Vapor Deposited Silicon Nitride Films

Tina J. Cotler, J. Chapple-Sokol · Journal of The Electrochemical Society · 1993 · 43 citations

Materials Science, Lpcvd Films, High Temperature Materials +13