Concepedia

Philipp Schaible

PS

7

Publications

505

Citations

7

H-Index

1965

Active since

Affiliations

IBM (United States)(Current)

Philipp Schaible is an author at IBM (United States) specializing in engineering, applied physics, and surface science.

Top concepts

EngineeringApplied PhysicsSurface ScienceMaterial ScienceMicroelectronicsMaterials EngineeringChemical EngineeringThin FilmsMicrofabricationCorrosion

Publications per year

1965–2002

7

Publications

7

Thin Films Deposited by Bias Sputtering

L. I. Maissel, Philipp Schaible · Journal of Applied Physics · 1965 · 170 citations

Materials Science, Materials Engineering, Chemical Engineering +15

Reactive ion etching of silicon

G. C. Schwartz, Philipp Schaible · Journal of Vacuum Science and Technology · 1979 · 112 citations

Materials Science, Materials Engineering, Chemical Engineering +13

Reactive ion etching of aluminum and aluminum alloys in an rf plasma containing halogen species

Philipp Schaible, Wilhelm Metzger, J. P. Anderson · Journal of Vacuum Science and Technology · 1978 · 84 citations

Engineering, Reactive Ion Etching, Plasma Processing +16

Reactive Ion Etching of Copper Films

G. C. Schwartz, Philipp Schaible · Journal of The Electrochemical Society · 1983 · 79 citations

Materials Engineering, Materials Science, Engineering +7

Preferential lateral chemical etching in reactive ion etching of aluminum and aluminum alloys

Philipp Schaible, G. C. Schwartz · Journal of Vacuum Science and Technology · 1979 · 25 citations

Aluminium Nitride, Engineering, Lateral Etching +17

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