N. Arnold

22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL

P. Chang, C. Ortolland, David Fried et al. · 2012 · 89 citations

High-performance Soi Technology, Engineering, Vlsi Design +16

A new hybrid algorithm for analysis of HVDC and FACTS systems

Glenn Warwick Jan Anderson, N.R. Watson, N. Arnold et al. · 2002 · 59 citations

Engineering, Power Electronics, Stability +17

Diffusion in III-V semiconductors from spin-on-film sources

N. Arnold, R. Schmitt, K. Heime · Journal of Physics D Applied Physics · 1984 · 59 citations

Semiconductors, Spintronics, Materials Science +12

A novel trench DRAM cell with a vertical access transistor and buried strap (VERI BEST) for 4 Gb/16 Gb

U. Gruening, C. Radens, J. Mandelman et al. · 2003 · 13 citations

Electrical Engineering, Engineering, Vertical Access Transistor +10