J.-Ch. Barbé

Undulation of sub-100nm porous dielectric structures: A mechanical analysis

Maxime Darnon, T. Chevolleau, O. Joubert et al. · Applied Physics Letters · 2007 · 52 citations · Full text

Engineering, Mechanical Analysis, Microelectronics Technologies +20

Hydrogen annealing of arrays of planar and vertically stacked Si nanowires

E. Dornel, T. Ernst, J.-Ch. Barbé et al. · Applied Physics Letters · 2007 · 50 citations

Engineering, Nanodevices, Si Nanowires +25

25nm Short and Narrow Strained FDSOI with TiN/HfO2 Gate Stack

S. Deleonibus, C. Mazure, P. Gaud et al. · 2006 · 26 citations

Electrical Engineering, Engineering, Physics +12

Comparative Scalability of PVD and CVD TiN on HfO2 as a Metal Gate Stack for FDSOI cMOSFETs down to 25nm Gate Length and Width

F. Andrieu, O. Faynot, X. Garros et al. · 2006 · 25 citations

Semiconductor Technology, Gate Stack, Electrical Engineering +13

High-Temperature Containerless Viscosity Measurement by Gas-Film Levitation

J.-Ch. Barbé, C. Parayre, M. Papoular et al. · International Journal of Thermophysics · 1999 · 15 citations