Kurt E. Wampler

Practical method for full-chip optical proximity correction

J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 41 citations

Optical Materials, Engineering, Optic Design +17

Contact hole reticle optimization by using interference mapping lithography (IML)

Robert Socha, Douglas J. Van Den Broeke, Stephen Hsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 29 citations

Engineering, Electron-beam Lithography, Microscopy +21

Optical proximity correction for intermediate-pitch features using sub-resolution scattering bars

J. Fung Chen, Tom Laidig, Kurt E. Wampler et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 21 citations

Engineering, Optic Design, Optical Testing +18

Practical technology path to sub-0.10-μm process generations via enhanced optical lithography

J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 15 citations

Engineering, Electron-beam Lithography, Process Generations +17

Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Stephen Hsu, Noel Corcoran, Mark Eurlings et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 14 citations

Engineering, Vlsi Design, Electron-beam Lithography +23