Mark Eurlings

Si/XeF2 etching: Reaction layer dynamics and surface roughening

M. J. M. Vugts, Mark Eurlings, L.J.F. Hermans et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 39 citations

Materials Science, Surface Characterization, Engineering +14

Si/XeF2 etching: Temperature dependence

M. J. M. Vugts, Gilles Verschueren, Mark Eurlings et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 32 citations · Full text

Engineering, Etch Reaction, Temperature Dependence +18

Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments

Gian F. Lorusso, Natalia Davydova, Mark Eurlings et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 16 citations

Photonics, Electrical Engineering, Ultraviolet Light +15

Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Stephen Hsu, Noel Corcoran, Mark Eurlings et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 14 citations

Engineering, Vlsi Design, Electron-beam Lithography +23