Concepedia

Douglas J. Van Den Broeke

DJ

3

Publications

55

Citations

3

H-Index

2002

Active since

Affiliations

ASML (United States)(Current)

Motorola (United States)

Douglas J. Van Den Broeke is an author at ASML (United States) specializing in applied physics, microscopy, and optical systems.

Top concepts

MicroscopyEngineeringApplied PhysicsOptical SystemsMedicineOphthalmologyInstrumentationMicroelectronicsMicrofabricationOptical Metrology

Publications per year

2002–2004

3

Publications

3

Contact hole reticle optimization by using interference mapping lithography (IML)

Robert Socha, Douglas J. Van Den Broeke, Stephen Hsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 29 citations

Engineering, Electron-beam Lithography, Microscopy +21

Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)

Douglas J. Van Den Broeke, J. Fung Chen, Thomas L. Laidig et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 13 citations

Optical Materials, Engineering, Electron-beam Lithography +24

Contact hole reticle optimization by using interference mapping lithography (IML)

Robert Socha, Douglas J. Van Den Broeke, Stephen D. H. Hsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 13 citations

Engineering, Electron-beam Lithography, Microscopy +21

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