Chen-Chien Li - Concepedia

Author

Chen-Chien Li

National Tsing Hua University

Also Known As

Chen-Chien Li

Publications

261

Citations

H-Index

Concepts

All Affiliations

National Tsing Hua University National Institutes of Applied Research

About

Chen-Chien Li is an author at National Tsing Hua University specializing in applied physics, engineering, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	187
2	Applied Physics	7	7	187
3	Electrical Engineering	6	6	160
4	Chemistry	1	1	27
5	Materials Engineering	1	1	39

Chen-Chien Li

Publications

208

Citations

H-Index

Page 1

	Year	Citations
Improved Electrical Characteristics of Ge MOS Devices With High Oxidation State in <inline-formula> <tex-math notation="TeX">${\rm HfGeO}_{\rm x}$ </tex-math></inline-formula> Interfacial Layer Formed by <italic>In Situ</italic> Desorption Chen-Chien Li, Kuei‐Shu Chang‐Liao, Li-Jung Liu, IEEE Electron Device Letters EngineeringOxidation ResistancePlasma ProcessingSemiconductor DeviceElectrical Characteristics	2014	39
Improved Electrical Characteristics of Ge pMOSFETs With ZrO<sub>2</sub>/HfO<sub>2</sub>Stack Gate Dielectric Chen-Chien Li, Kuei‐Shu Chang‐Liao, Wei-Fong Chi, IEEE Electron Device Letters Device ModelingElectrical CharacteristicsElectrical EngineeringGe MosfetsEngineering	2015	34
A higher-k tetragonal HfO2 formed by chlorine plasma treatment at interfacial layer for metal-oxide-semiconductor devices Chung-Hao Fu, Kuei‐Shu Chang‐Liao, Chen-Chien Li, Applied Physics Letters Materials ScienceIi-vi SemiconductorOptical MaterialsEngineeringCrystalline Defects	2012	27
An Ultralow EOT Ge MOS Device With Tetragonal HfO<sub>2</sub> and High Quality Hf<sub><italic>x</italic></sub>Ge<sub><italic>y</italic></sub>O Interfacial Layer Chung-Hao Fu, Kuei‐Shu Chang‐Liao, Li-Jung Liu, IEEE Transactions on Electron Devices Oxide HeterostructuresWide-bandgap SemiconductorElectrical EngineeringEngineeringPhysics	2014	27
Improved Electrical Characteristics of Bulk FinFETs With SiGe Super-Lattice-Like Buried Channel Yanlin Li, Kuei‐Shu Chang‐Liao, Chen-Chien Li, IEEE Electron Device Letters Electrical CharacteristicsElectrical EngineeringEngineeringRf SemiconductorNanoelectronics	2019	26
Electrical and Reliability Characteristics of FinFETs With High-<i>k</i> Gate Stack and Plasma Treatments Yanlin Li, Kuei‐Shu Chang‐Liao, Chen-Chien Li, IEEE Transactions on Electron Devices	2020	21
Enhanced Hole Mobility and Low $Tinv$ for pMOSFET by a Novel Epitaxial Si/Ge Superlattice Channel Chung-Hao Fu, Kuei‐Shu Chang‐Liao, Li-Jung Liu, IEEE Electron Device Letters Sige ChannelsSemiconductor TechnologyElectrical EngineeringEngineeringEnhanced Hole Mobility	2012	18
Improved electrical characteristics high-k gated MOS devices with in-situ remote plasma treatment in atomic layer deposition Chen-Chien Li, Kuei‐Shu Chang‐Liao, Chung-Hao Fu, Microelectronic Engineering Electrical CharacteristicsElectrical EngineeringMos DevicesEngineeringIon Implantation	2013	16

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