Ramune Nagisetty

A 90-nm logic technology featuring strained-silicon

Scott E. Thompson, M Armstrong, C. Auth et al. · IEEE Transactions on Electron Devices · 2004 · 666 citations

Engineering, Electrical Engineering, Materials Science +17

A 65nm logic technology featuring 35nm gate lengths, enhanced channel strain, 8 Cu interconnect layers, low-k ILD and 0.57 μm/sub 2/ SRAM cell

C. Auth, S. Balakrishnan, M. Bost et al. · 2005 · 230 citations

Engineering, Computer Engineering, Electrical Engineering +17

2.5D and 3D Heterogeneous Integration: Emerging applications

Farhana Sheikh, Ramune Nagisetty, Tanay Karnik et al. · IEEE Solid-State Circuits Magazine · 2021 · 116 citations

Computing, Computer Engineering, Computer Science +17

Organic Multi-Channel Optoelectronic Sensors for Wearable Health Monitoring

Yasser Khan, Donggeon Han, Jonathan Ting et al. · IEEE Access · 2019 · 112 citations · Full text

Engineering, Biomedical Engineering, Materials Science +17

An advanced low power, high performance, strained channel 65nm technology

S. Tyagi, C. Kenyon, S.-H. Lee et al. · 2005 · 65 citations

Engineering, Electrical Engineering, Microelectronics +13