S. Kalpat

A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

X. Chen, S. Samavedam, Vijay Narayanan et al. · 2008 · 113 citations

Engineering, Computer Engineering, Electrical Engineering +16

CMOS Vertical Multiple Independent Gate Field Effect Transistor (MIGFET)

L. Mathew, Yaping Du, Aaron Thean et al. · 2005 · 86 citations

Engineering, Electrical Engineering, Analog Electronics +16

Impact of titanium addition on film characteristics of HfO2 gate dielectrics deposited by atomic layer deposition

Dina H. Triyoso, R. I. Hegde, Stefan Zollner et al. · Journal of Applied Physics · 2005 · 79 citations

Natural Sciences, Materials Engineering, Materials Science +17

Challenges for the integration of metal gate electrodes

J. Schaeffer, C. Capasso, L. R. C. Fonseca et al. · 2005 · 71 citations

Engineering, Materials Engineering, Materials Science +17

Highly oriented lead zirconium titanate thin films: Growth, control of texture, and its effect on dielectric properties

S. Kalpat, Kenji Uchino · Journal of Applied Physics · 2001 · 71 citations

Natural Sciences, Materials Engineering, Materials Science +17