Anupama Mallikarjunan

Dual stress liner for high performance sub-45nm gate length SOI CMOS manufacturing

Haining Yang, R. Malik, Y. Li et al. · 2005 · 142 citations

Engineering, Electrical Engineering, Manufacturing Engineering +11

β -phase tungsten nanorod formation by oblique-angle sputter deposition

Tansel Karabacak, Anupama Mallikarjunan, J. P. Singh et al. · Applied Physics Letters · 2003 · 128 citations

Natural Sciences, Materials Engineering, Materials Science +17

Metal drift behavior in low dielectric constant organosiloxane polymer

Anupama Mallikarjunan, S. P. Murarka, Toh‐Ming Lu · Applied Physics Letters · 2001 · 75 citations

Natural Sciences, Materials Engineering, Materials Science +17

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(<i>sec</i>-butylamino)silane and N₂Plasma on Planar and 3D Substrate Topographies

Tahsin Faraz, Maarten van Drunen, Harm C. M. Knoops et al. · ACS Applied Materials & Interfaces · 2016 · 52 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-<i>sec</i>-butylaminosilane and Bis(<i>tert</i>-butylamino)silane with Ozone

Luis Fabián Peña, Charith E. Nanayakkara, Anupama Mallikarjunan et al. · The Journal of Physical Chemistry C · 2016 · 43 citations

Natural Sciences, Chemistry, Materials Science +17