P. Varekamp

Voltage-dependent voltage-acceleration of oxide breakdown for ultra-thin oxides

Ernest Y. Wu, J. Aitken, E. Nowak et al. · 2002 · 82 citations

Electrical Engineering, Engineering, Defect Generation Probability +10

A high performance 0.13 μm SOI CMOS technology with Cu interconnects and low-k BEOL dielectric

P. Smeys, V. McGahay, Insoon Yang et al. · 2002 · 24 citations

Low-k Beol Dielectric, Electrical Engineering, Cu Wiring +14

Breakdown measurements of ultra-thin SiO/sub 2/ at low voltage

J. H. Stathis, A. Vayshenker, P. Varekamp et al. · 2002 · 20 citations

Electrical Engineering, Engineering, Defect Generation Probability +11

Subresolution assist feature implementation for high-performance logic gate-level lithography

Allen H. Gabor, James A. Bruce, W. H. Chu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 10 citations

Electrical Engineering, Physical Design (Electronics), Engineering +13

A high performance 0.13 μm SOI CMOS technology with a 70 nm silicon film and with a second generation low-k Cu BEOL

J.W. Sleight, P. Varekamp, N. Lustig et al. · 2002 · 10 citations

Electrical Engineering, Second Generation 1.2, Engineering +15