Joseph Klingfus

Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

Joel K. W. Yang, B. Cord, Huigao Duan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 180 citations · Full text

Materials Engineering, Materials Science, Wafer Scale Processing +15

Limiting factors in sub-10nm scanning-electron-beam lithography

B. Cord, Joel K. W. Yang, Huigao Duan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 72 citations · Full text

Metrology Limitations, Engineering, Physics +15

Large area direct-write focused ion-beam lithography with a dual-beam microscope

Alexandra Joshi‐Imre, Leonidas E. Ocola, Lauren Rich et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 15 citations

Engineering, Electron-beam Lithography, Microscopy +20

High resolution and high density ion beam lithography employing HSQ resist

L. Bruchhaus, S. Bauerdick, Lloyd Peto et al. · Microelectronic Engineering · 2012 · 13 citations

Hsq Resist, High Resolution, Engineering +10

Fixed Beam Moving Stage Electron Beam Lithography of Waveguide Coupling Device Structures

Jason E. Sanabia, Kevin E. Burcham, Joseph Klingfus et al. · 2012 · 11 citations