Philip Schumaker

Step and Repeat UV nanoimprint lithography tools and processes

Ian McMackin, Jin Choi, Philip Schumaker et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 55 citations

Materials Science, Molecular Imprints, Engineering +14

Development of imprint materials for the Step and Flash Imprint Lithography process

Frank Xu, Nicholas A. Stacey, M. Watts et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 30 citations

Analysis of critical dimension uniformity for Step and Flash imprint lithography

David P. Mancini, Kathleen A. Gehoski, William J. Dauksher et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 13 citations

Engineering, Electron-beam Lithography, Pattern Transfer +21

Design and performance of a step and repeat imprinting machine

Ian McMackin, Philip Schumaker, Daniel Babbs et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 13 citations

Imprio 100, Engineering, Electron-beam Lithography +19

<title>Direct to digital holography for semiconductor wafer defect detection and review</title>

C. E. Thomas, Tracy M. Bahm, L. R. Baylor et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 12 citations

Holography, Engineering, Electron-beam Lithography +17