Warren Montgomery

Statistics

Publications

Citations

464

H-Index

Active since

2007

Affiliations

University at Albany, State University of New York(Current)

Advanced Micro Devices (United States)

Center for Nanoscale Science and Technology

Lawrence Berkeley National Laboratory

Micron (United States)

Warren Montgomery is an author at University at Albany, State University of New York specializing in materials science, materials engineering, and natural sciences.

Publications per year

2007–2016

Publications

22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Chris Bencher, Yong Mei Chen, Huixiong Dai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 129 citations

Engineering, Manufacturing Engineering, Materials Science +17

Evaluation of EUV resist materials for use at the 32 nm half-pitch node

Thomas I. Wallow, Craig Higgins, Robert L. Brainard et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 108 citations

Natural Sciences, Materials Engineering, Materials Science +8

Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Marie Krysak, Markos Trikeriotis, Evan L. Schwartz et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 64 citations

Natural Sciences, Materials Engineering, Materials Science +17

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu et al. · Microelectronic Engineering · 2009 · 31 citations

Natural Sciences, Electrical Engineering, Materials Science +7

Pathway to sub-30nm Resolution in EUV Lithography

James W. Thakerlay, Roger A. Nassar, Kathleen Spear-Alfonso et al. · Journal of Photopolymer Science and Technology · 2007 · 29 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +12

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