M.-F. Li

Fermi Pinning-Induced Thermal Instability of Metal-Gate Work Functions

H.Y. Yu, C. Ren, Yee‐Chia Yeo et al. · IEEE Electron Device Letters · 2004 · 131 citations

Engineering, Electrical Engineering, Materials Science +17

High Temperature Stable [Ir3Si-TaN]/HfLaON CMOS with Large Work-Function Difference

Chao‐Hsin Wu, B.F. Hung, Albert Chin et al. · 2006 · 27 citations

Engineering, Computer Engineering, Electrical Engineering +8

Dual Metal Gates with Band-Edge Work Functions on Novel HfLaO High-K Gate Dielectric

Xizu Wang, Chen Shen, M.-F. Li et al. · 2006 · 24 citations

Engineering, Electrical Engineering, Materials Science +17

HfO/sub 2/ and lanthanide-doped HfO/sub 2/ MIM capacitors for RF/mixed IC applications

Sun Jung Kim, Byung Jin Cho, M.-F. Li et al. · 2004 · 23 citations

Engineering, Electrical Engineering, Materials Science +17

Engineering of voltage nonlinearity in high-k MIM capacitor for analog/mixed-signal ICs

Sun Jung Kim, B.J. Cho, M.-F. Li et al. · 2004 · 22 citations

Engineering, Electrical Engineering, Materials Science +17