Byung Jin Cho

Physical and electrical characterization of HfO2 metal–insulator–metal capacitors for Si analog circuit applications

Hang Hu, Chunxiang Zhu, Y. F. Lu et al. · Journal of Applied Physics · 2003 · 108 citations

Hfo2 Thin Films, Engineering, Integrated Circuits +17

Improvement of Voltage Linearity in High-<tex>$kappa$</tex>MIM Capacitors Using<tex>$hbox HfO_2hbox --hbox SiO_2$</tex>Stacked Dielectric

S.J. Kim, Byung Jin Cho, M.F. Li et al. · IEEE Electron Device Letters · 2004 · 93 citations

Materials Science, Electrical Engineering, Dielectrics +11

Thermal stability of (HfO2)x(Al2O3)1−x on Si

H.Y. Yu, Nan Wu, M. F. Li et al. · Applied Physics Letters · 2002 · 92 citations

Materials Engineering, Materials Science, Pure Hfo2 +12

Mechanisms of photoluminescence from silicon nanocrystals formed by pulsed-laser deposition in argon and oxygen ambient

Xiaoyong Chen, Yonghai Lu, Yunzhuo Wu et al. · Journal of Applied Physics · 2003 · 76 citations

Engineering, Colloidal Nanocrystals, Optoelectronic Devices +22

MIM capacitors using atomic-layer-deposited high-/spl kappa/ (HfO/sub 2/)/sub 1-x/(Al/sub 2/O/sub 3/)/sub x/ dielectrics

Hang Hu, Chunxiang Zhu, Xiongfei Yu et al. · IEEE Electron Device Letters · 2003 · 73 citations

Dielectrics, Engineering, Capacitance Density +18