C. Ren

Fermi Pinning-Induced Thermal Instability of Metal-Gate Work Functions

H.Y. Yu, C. Ren, Yee‐Chia Yeo et al. · IEEE Electron Device Letters · 2004 · 131 citations

Engineering, Silicon On Insulator, Defect Tolerance +17

Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs

X.P. Wang, Mingfu Li, C. Ren et al. · IEEE Electron Device Letters · 2005 · 67 citations

Materials Science, Electrical Engineering, Semiconductor Device +12

Fermi-Level Pinning Induced Thermal Instability in the Effective Work Function of TaN in<tex>$hbox TaN/SiO_2$</tex>Gate Stack

C. Ren, H.Y. Yu, Jinfeng Kang et al. · IEEE Electron Device Letters · 2004 · 56 citations

Gate Stack, Electrical Engineering, Engineering +14

A Dual-Metal Gate Integration Process for CMOS With Sub-1-nm EOT<tex>$hbox HfO_2$</tex>by Using HfN Replacement Gate

C. Ren, H.Y. Yu, Jinfeng Kang et al. · IEEE Electron Device Letters · 2004 · 54 citations

Hfn Dummy Gate, Vlsi Design, Engineering +17

A novel high performance stacked LDD RF LDMOSFET

Jian Cai, C. Ren, N. Balasubramanian et al. · IEEE Electron Device Letters · 2001 · 24 citations

Low-power Electronics, Electrical Engineering, Engineering +12