Concepedia

M. Koike

MK

Statistics

Publications

17

Citations

444

H-Index

13

Active since

1968

Affiliations

Toshiba (Japan)(Current)

National Institute of Advanced Industrial Science and Technology

Tokyo Institute of Technology

M. Koike is an author at Toshiba (Japan) specializing in materials science, electronic materials, and semiconductor device materials.

Publications per year

1968–2014

17

Publications

17

Effects of nitrogen in HfSiON gate dielectric on the electrical and thermal characteristics

M. Koyama, A. Kaneko, Tsunehiro Ino et al. · 2003 · 77 citations

Natural Sciences, Materials Science, Physics +17

High-performance poly-Ge short-channel metal–oxide–semiconductor field-effect transistors formed on SiO<sub>2</sub>layer by flash lamp annealing

Koji Usuda, Yoshiki Kamata, Yuuichi Kamimuta et al. · Applied Physics Express · 2014 · 75 citations

Engineering, Electrical Engineering, Materials Science +17

Operation of inverter and ring oscillator of ultrathin-body poly-Ge CMOS

Yoshiki Kamata, M. Koike, Etsuo Kurosawa et al. · Applied Physics Express · 2014 · 38 citations

Engineering, Electrical Engineering, Materials Science +17

Determination of Band Alignment of Hafnium Silicon Oxynitride/Silicon (HfSiON/Si) Structures using Electron Spectroscopy

Yuuichi Kamimuta, M. Koike, Tsunehiro Ino et al. · Japanese Journal of Applied Physics · 2005 · 32 citations

Natural Sciences, Materials Science, Physics +17

High-performance tri-gate poly-Ge junction-less p- and n-MOSFETs fabricated by flash lamp annealing process

Koji Usuda, Y. Kamata, Y. Kamimuta et al. · 2014 · 29 citations

Engineering, Electrical Engineering, Materials Science +17

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