Effects of nitrogen in HfSiON gate dielectric on the electrical and thermal characteristics

M. Koyama, A. Kaneko, Tsunehiro Ino, +10

EngineeringThermal CharacteristicsSilicon On InsulatorSemiconductor DeviceNanoelectronics +16

Process integration technology and device characteristics of CMOS FinFET on bulk silicon substrate with sub-10 nm fin width and 20 nm gate length

K. Okano, T. Izumida, H. Kawasaki, +19

Electrical EngineeringBulk Silicon SubstrateEngineeringWafer Scale ProcessingAdvanced Packaging (Semiconductors) +7

High-Performance FinFET with Dopant-Segregated Schottky Source/Drain

A. Kaneko, A. Yagishita, K. Yahashi, +18

Low-power ElectronicsPropagation Delay TimeElectrical EngineeringEngineeringNanoelectronics +8

Embedded Bulk FinFET SRAM Cell Technology with Planar FET Peripheral Circuit for hp32 nm Node and Beyond

Hikaru Kawasaki, K. Okano, A. Kaneko, +15

Electrical EngineeringEngineeringVlsi DesignStatic Noise MarginHp32 Nm Node +10

Sidewall transfer process and selective gate sidewall spacer formation technology for sub-15nm finfet with elevated source/drain extension

A. Kaneko, A. Yagishita, K. Yahashi, +15

Electrical EngineeringEngineeringSidewall Transfer ProcessSpacer FormationNanoelectronics +6

Expression of the c-met/Hepatocyte Growth Factor Receptor Gene During Rat Liver Regeneration Induced by Carbon Tetrachloride

Tomonobu Ito, Norio Hayashi, Masayoshi Horimoto, +5

Biochemical and Biophysical Research Communications

Developmental BiologyHepatologyCarbon TetrachlorideLiver PhysiologyHepatotoxicity +6

Nitrogen profile control by plasma nitridation technique for poly-Si gate HfSiON CMOSFET with excellent interface property and ultra-low leakage current

Ken‐Taro Sekine, Seiji Inumiya, Motoyuki Sato, +3

Materials ScienceElectrical EngineeringNitrogen Profile ControlUltra-low LeakageBoron Diffusion +10

Fabrication of HfSiON gate dielectrics by plasma oxidation and nitridation, optimized for 65 nm mode low power CMOS applications

Seiji Inumiya, Ken‐Taro Sekine, S. Niwa, +10

Materials ScienceMaterials EngineeringElectrical EngineeringSemiconductor DeviceEngineering +11

Three-dimensional stress engineering in FinFETs for mobility/on-current enhancement and gate current reduction

M. Saitoh, A. Kaneko, K. Okano, +3

EngineeringThree-dimensional Stress EngineeringInf XmlnsSemiconductor DeviceNanoelectronics +15

Acid phosphatases from different cell types in rat liver

A. Kaneko, Timothy P. Ikeda, Tamenori Onoé

Biochimica et Biophysica Acta (BBA) - General Subjects

Lipid SynthesisBiochemistryNatural SciencesLiver PhysiologyPhysiology +7