Concepedia

J. T. C. Lee

JT

4

Publications

80

Citations

4

H-Index

1994

Active since

Affiliations

Massachusetts Institute of Technology(Current)

AT&T (United States)

J. T. C. Lee is an author at Massachusetts Institute of Technology specializing in engineering, applied physics, and electrical engineering.

Top concepts

EngineeringApplied PhysicsPhysicsPlasma PhysicsMicroelectronicsElectrical EngineeringPlasma TheoryPlasma ScienceNatural SciencesPlasma Confinement

Publications per year

1994–1994

4

Publications

4

Comparison of advanced plasma sources for etching applications. I. Etching rate, uniformity, and profile control in a helicon and a multiple electron cyclotron resonance source

I. Tepermeister, N. Blayo, F. Klemens et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 28 citations

I. Etching Rate, Electrical Engineering, Polysilicon Films +13

Comparison of advanced plasma sources for etching applications. III. Ion energy distribution functions for a helicon and a multipole electron cyclotron resonance source

G. Gibson, Herbert H. Sawin, I. Tepermeister et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 18 citations

Engineering, Nuclear Physics, Plasma Science +20

Comparison of advanced plasma sources for etching applications. II. Langmuir probe studies of a helicon and a multipole electron cyclotron resonance source

I. Tepermeister, D. E. Ibbotson, J. T. C. Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 18 citations

Langmuir Probe Studies, Plasma Uniformity, Engineering +20

Comparison of advanced plasma sources for etching applications. IV. Plasma induced damage in a helicon and a multipole electron cyclotron resonance source

N. Blayo, I. Tepermeister, J. L. Benton et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 16 citations

Plasma Induced Damage, Electrical Engineering, Crystalline Silicon +15

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