Judon Stoeldraijer

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 90 citations

Engineering, Electrical Engineering, Manufacturing Engineering +15

ASML's NXE platform performance and volume introduction

Rudy Peeters, Sjoerd Lok, Erwin van Alphen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 71 citations

Engineering, Computer Engineering, Manufacturing Engineering +7

The future of EUV lithography: enabling Moore's Law in the next decade

Alberto Pirati, Jan van Schoot, Kars Troost et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations

Engineering, Electrical Engineering, Optics +12

High-NA EUV lithography exposure tool: program progress

Jan van Schoot, Eelco van Setten, Kars Troost et al. · 2020 · 59 citations

Natural Sciences, Computer Systems, Digital Imaging +12

Performance overview and outlook of EUV lithography systems

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 52 citations

Engineering, Electrical Engineering, Materials Science +8