F. Nemouchi - Concepedia

Author

F. Nemouchi

Laboratoire d'Électronique des Technologies de l'Information ORCID

Also Known As

F. Nemouchi, Fabrice Nemouchi, Nemouchi, Fabrice

115

Publications

1.2K

Citations

H-Index

Concepts

All Affiliations

Laboratoire d'Électronique des Technologies de l'Information Commissariat à l'Énergie Atomique et aux Énergies Alternatives CEA Grenoble Université Grenoble Alpes STMicroelectronics (France)

About

F. Nemouchi is an author at Laboratoire d'Électronique des Technologies de l'Information specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	31	964
2	Applied Physics	16	26	813
3	Chemistry	8	8	208
4	Chemical Engineering	3	3	97
5	Natural Sciences	2	2	207

F. Nemouchi

Publications

988

Citations

H-Index

Page 1

	Year	Citations
3DVLSI with CoolCube process: An alternative path to scaling P. Batude, C. Fenouillet-Béranger, L. Pasini, EngineeringVlsi DesignComputer ArchitectureComputer-aided DesignOptoelectronic Devices	2015	134
Differential scanning calorimetry analysis of the linear parabolic growth of nanometric Ni silicide thin films on a Si substrate F. Nemouchi, D. Mangelinck, C. Bergman, Applied Physics Letters Si SubstrateEngineeringCrystal Growth TechnologySolid-state ChemistrySilicon On Insulator	2005	73
3D Sequential Integration: Application-driven technological achievements and guidelines P. Batude, Laurent Brunet, C. Fenouillet-Béranger, Contact PitchEngineering3D ModelingComputer-aided DesignSequential Integration	2017	73
3D monolithic integration: Technological challenges and electrical results M. Vinet, P. Batude, C. Tabone, Microelectronic Engineering 3D Ic ArchitectureEngineeringAdvanced Packaging (Semiconductors)Device IntegrationTechnological Challenges	2010	65
Hybrid III–V/Silicon Technology for Laser Integration on a 200-mm Fully CMOS-Compatible Silicon Photonics Platform Bertrand Szelag, Karim Hassan, Laetitia Adelmini, IEEE Journal of Selected Topics in Quantum Electronics Optical MaterialsEngineeringDevice IntegrationIntegrated PhotonicsCmos Compatible Metallizations	2019	63
New insights on bottom layer thermal stability and laser annealing promises for high performance 3D VLSI C. Fenouillet-Béranger, B. Mathieu, B. Prévitali, EngineeringVlsi DesignNew InsightsIntegrated CircuitsSemiconductor Device	2014	56
Simultaneous growth of Ni5Ge3 and NiGe by reaction of Ni film with Ge F. Nemouchi, D. Mangelinck, C. Bergman, Applied Physics Letters Materials EngineeringMaterials ScienceChemical EngineeringEngineeringNanotechnology	2006	53
A comparative study of nickel silicides and nickel germanides: Phase formation and kinetics F. Nemouchi, D. Mangelinck, János L. Lábár, Microelectronic Engineering Materials ScienceInorganic ChemistryEngineeringPhase EquilibriumComparative Study	2006	48
Nickel silicides and germanides: Phases formation, kinetics and thermal expansion C. Perrin, D. Mangelinck, F. Nemouchi, Materials Science and Engineering B Transition Metal ChalcogenidesEngineeringApplied PhysicsCondensed Matter PhysicsSilicene	2008	32
Schottky Barrier Height Extraction in Ohmic Regime: Contacts on Fully Processed GeOI Substrates Louis Hutin, C. Le Royer, C. Tabone, Journal of The Electrochemical Society Surface CharacterizationElectrical EngineeringSchottky Barrier HeightEngineeringPhysics	2009	27

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