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Differential scanning calorimetry analysis of the linear parabolic growth of nanometric Ni silicide thin films on a Si substrate
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2005
Year
Si SubstrateEngineeringCrystal Growth TechnologySolid-state ChemistrySilicon On InsulatorSiliceneMaterial PhysicCalorimetry AnalysisThin Film ProcessingMaterials EngineeringMaterials SciencePhysicsNanotechnologyLinear Parabolic GrowthMaterial AnalysisSurface ScienceApplied PhysicsCondensed Matter PhysicsMaterials CharacterizationThin FilmsChemical Vapor Deposition
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation F. Nemouchi, D. Mangelinck, C. Bergman, P. Gas, Ulf Smith; Differential scanning calorimetry analysis of the linear parabolic growth of nanometric Ni silicide thin films on a Si substrate. Appl. Phys. Lett. 24 January 2005; 86 (4): 041903. https://doi.org/10.1063/1.1852727 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioApplied Physics Letters Search Advanced Search |Citation Search
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