G. Lammer

Novel electrostatic column for ion projection lithography

A. Chalupka, G. Stengl, H. Buschbeck et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 24 citations

Natural Sciences, Materials Science, Physics +11

Experimental investigation of stochastic space charge effects on pattern resolution in ion projection lithography systems

E. Hammel, A. Chalupka, J. Fegerl et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 16 citations

Engineering, Physics, Microelectromechanical Systems +10

Projection ion beam lithography

H. Löschner, G. Stengl, A. Chalupka et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 15 citations

Engineering, Electrical Engineering, Physics +13

Progress in ion projection lithography

A. Chalupka, J. Fegerl, R. Fischer et al. · Microelectronic Engineering · 1992 · 13 citations

Engineering, Materials Science, Electronic Materials +6

<i>p-n</i> junction-based wafer flow process for stencil mask fabrication

Ivo W. Rangelow, F.G. Shi, B. Volland et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 13 citations

Engineering, Electrical Engineering, Materials Science +17