Concepedia

Hiroshi Kanoh

HK

Statistics

Publications

12

Citations

262

H-Index

11

Active since

1990

Affiliations

Tokyo Institute of Technology(Current)

Japan Display (Japan)

Hiroshi Kanoh is an author at Tokyo Institute of Technology specializing in applied physics, engineering, and thin films.

Top concepts

EngineeringApplied PhysicsThin FilmsMaterial ScienceElectrical EngineeringSurface ScienceMicroelectronicsElectronic DevicesSemiconductorsNanoelectronics

Publications per year

1990–2006

12

Publications

12

Dependence of self-heating effects on operation conditions and device structures for polycrystalline silicon TFTs

Kazushige Takechi, Mitsuru Nakata, Hiroshi Kanoh et al. · IEEE Transactions on Electron Devices · 2006 · 47 citations

Engineering, Silicon On Insulator, Self-heating Effects +18

Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors

Byung‐Chul Ahn, Kazuhiro Shimizu, Tsutomu Satoh et al. · Japanese Journal of Applied Physics · 1991 · 28 citations

Materials Science, Materials Engineering, Electrical Engineering +14

Amorphous-silicon/silicon-nitride thin-film transistors fabricated by plasma-free (chemical vapor deposition) method

Hiroshi Kanoh, Osamu Sugiura, Paul A. Breddels et al. · IEEE Electron Device Letters · 1990 · 27 citations

Thin Film Physics, Engineering, Thin Film Process Technology +18

Hydrogen-Radical Annealing of Chemical Vapor-Deposited Amorphous Silicon Films

Yasutaka Uchida, Hiroshi Kanoh, Osamu Sugiura et al. · Japanese Journal of Applied Physics · 1990 · 25 citations

Materials Science, Semiconductors, Electrical Engineering +15

Chemical Vapor Deposition of Amorphous Silicon Using Tetrasilane

Hiroshi Kanoh, Osamu Sugiura, Masakiyo Matsumura · Japanese Journal of Applied Physics · 1993 · 25 citations

Engineering, Semiconductor Materials, Optoelectronic Devices +17

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