Masakiyo Matsumura - Concepedia

Author

Masakiyo Matsumura

Tokyo Institute of Technology

Also Known As

Masakiyo MATSUMURA, Masakiyo Matsumura, Masakiyo Matsumura Masakiyo Matsumura

218

Publications

2.4K

Citations

H-Index

Concepts

All Affiliations

Tokyo Institute of Technology

About

Masakiyo Matsumura is an author at Tokyo Institute of Technology specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	25	68	2K
2	Applied Physics	25	64	1.9K
3	Chemical Engineering	9	9	179
4	Chemistry	9	9	248
5	Natural Sciences	4	4	122

Masakiyo Matsumura

Publications

Citations

H-Index

Page 1

	Year	Citations
A Novel Phase-Modulated Excimer-Laser Crystallization Method of Silicon Thin Films Chang-Ho Oh Chang-Ho Oh, M. Ozawa, Masakiyo Matsumura Japanese Journal of Applied Physics Optical MaterialsEngineeringCrystal Growth TechnologyLaser ApplicationsSilicon On Insulator	1998	143
Theoretical Analysis of Amorphous-Silicon Field-Effect-Transistors Satoru Kishida, Yasuo Naruke, Yasutaka Uchida, Japanese Journal of Applied Physics Device ModelingSemiconductorsElectrical EngineeringElectronic DevicesEngineering	1983	87
Diagnostic Study of VHF Plasma and Deposition of Hydrogenated Amorphous Silicon Films Shunri Oda, Jun'ichirou Noda, Masakiyo Matsumura Japanese Journal of Applied Physics Diagnostic StudyLangmuir Probe MeasurementEngineeringPlasma PhysicsPlasma Processing	1990	78
Excimer-Laser-Induced Lateral-Growth of Silicon Thin-Films Kensuke Ishikawa, M. Ozawa, Chang-Ho Oh Chang-Ho Oh, Japanese Journal of Applied Physics Optical MaterialsEngineeringCrystal Growth TechnologyLaser ApplicationsExcimer-laser-induced Lateral-growth	1998	71
Atomic-layer chemical-vapor-deposition of silicon-nitride Shunsuke Morishita, Satoshi Sugahara, Masakiyo Matsumura Applied Surface Science Materials ScienceEngineeringSurface ScienceApplied PhysicsChemical Deposition	1997	65
Chemical Vapor Deposition of Nickel Oxide Films from Bis-π-Cyclopentadienyl-Nickel Wen-Chang Yeh Wen-Chang Yeh, Masakiyo Matsumura Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringOptical MaterialsEngineeringNanotechnology	1997	64
Atomic layer epitaxy of Si using atomic H Shigeru Imai, Toshio Iizuka, Osamu Sugiura, Thin Solid Films PhysicsApplied PhysicsMolecular Beam EpitaxySilicon On InsulatorEpitaxial Growth	1993	58
On-Chip Bottom-Gate Polysilicon and Amorphous Silicon Thin-Film Transistors Using Excimer Laser Annealing Kazuhiro Shimizu, Osamu Sugiura, Masakiyo Matsumura Japanese Journal of Applied Physics Electrical EngineeringElectronic DevicesOn-chip Bottom-gate PolysiliconElectronic MaterialsEngineering	1990	54
Quasi-monolayer deposition of silicon dioxide Werner Gasser, Yasutaka Uchida, Masakiyo Matsumura Thin Solid Films Materials ScienceEngineeringSurface ScienceApplied PhysicsQuasi-monolayer Deposition	1994	54
Drastic Enlargement of Grain Size of Excimer-Laser-Crystallized Polysilicon Films Do-Hyun Choi, Kazuhiro Shimizu, Osamu Sugiura, Japanese Journal of Applied Physics Materials SciencePolysilicon Thin FilmsEngineeringDrastic EnlargementMicrofabrication	1992	53

Page 1