Keundo Ban

Positive and negative tone double patterning lithography for 50nm flash memory

Chang-Moon Lim, Seo-Min Kim, Young-Sun Hwang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 54 citations

Engineering, Electrical Engineering, Materials Science +11

Gate-first high-k/metal gate DRAM technology for low power and high performance products

Minchul Sung, Se‐Aug Jang, Hyunjin Lee et al. · 2015 · 27 citations

Engineering, Electrical Engineering, Materials Science +17

Comparison study for 3x-nm contact hole CD uniformity between EUV lithography and ArF immersion double patterning

Keundo Ban, Junggun Heo, Hyunkyung Shim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 12 citations

Engineering, Electrical Engineering, Materials Science +11

Noble FeRAM technologies with MTP cell structure and BLT ferroelectric capacitors

Sohyun Oh, Suk Kyoung Hong, K. H. Noh et al. · 2004 · 12 citations

Natural Sciences, Electrical Engineering, Materials Science +8