Concepedia
Statistics
Publications
4
Citations
115
H-Index
Active since
2008
Affiliations
ASML (United States)(Current)
ASML (Netherlands)
Carl Zeiss (Germany)
Toshiba (United States)
IBM (United States)
Bart Kessels is an author at ASML (United States) specializing in electrical engineering, engineering, and electronic materials.
Publications per year
2008–2010
The use of EUV lithography to produce demonstration devices
Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations
Engineering, Electrical Engineering, Manufacturing Engineering +15
EUVL system: moving towards production
H. Meiling, Nico Buzing, K. D. Cummings et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 32 citations · Full text
Engineering, Electrical Engineering, Manufacturing Engineering +10
EUV lithography at the 22nm technology node
Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations
Engineering, Computer Engineering, Electrical Engineering +17
Performance of the full field EUV systems
H. Meiling, Edwin Boon, Nico Buzing et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 19 citations
Engineering, Electrical Engineering, Electronic Materials +6
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