Concepedia
Statistics
Publications
7
Citations
137
H-Index
Active since
2004
Affiliations
Rochester Institute of Technology(Current)
IMEC
Andrew Estroff is an author at Rochester Institute of Technology specializing in materials science, optics, and mask design.
Publications per year
2004–2006
Evanescent wave imaging in optical lithography
Bruce W. Smith, Yongfa Fan, Jianming Zhou et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 33 citations
Engineering, Materials Science, Microfabrication +15
Benefiting from polarization effects on high-NA imaging
Bruce W. Smith, Lena Zavyalova, Andrew Estroff · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 31 citations
Engineering, Materials Engineering, Materials Science +16
Immersion lithography fluids for high NA 193 nm lithography
Jianming Zhou, Yongfa Fan, Anatoly Bourov et al. · Optical Microlithography XVIII · 2005 · 21 citations
Natural Sciences, Materials Engineering, Materials Science +13
Mask-induced polarization effects at high numerical aperture
Andrew Estroff · Journal of Micro/Nanolithography MEMS and MOEMS · 2005 · 19 citations
Natural Sciences, Materials Engineering, Materials Science +15
Hyper NA water immersion lithography at 193nm and 248nm
Bruce W. Smith, Yongfa Fan, Jianming Zhou et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 12 citations
Engineering, Materials Engineering, Biomedical Imaging +6
1–5 of 7