Anatoly Bourov

Approaching the numerical aperture of water immersion lithography at 193-nm

Bruce W. Smith, Anatoly Bourov, Yongfa Fan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 23 citations

Plasma reactive ion etching of 193 nm attenuated phase shift mask materials

Bruce W. Smith, Carlos Fonseca, L. V. Zavyalova et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 21 citations

Engineering, Electron-beam Lithography, Chemistry +17

Immersion lithography fluids for high NA 193 nm lithography

Jianming Zhou, Yongfa Fan, Anatoly Bourov et al. · Optical Microlithography XVIII · 2005 · 21 citations

Engineering, Electron-beam Lithography, Optical Testing +18

Immersion microlithography at 193 nm with a Talbot prism interferometer

Anatoly Bourov, Yongfa Fan, Frank Cropanese et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 17 citations

Compact Prism, Engineering, Microscopy +19

In situ aberration measurement technique based on principal component analysis of aerial image

Lifeng Duan, Xiangzhao Wang, Anatoly Bourov et al. · Optics Express · 2011 · 17 citations · Full text

Engineering, Measurement, Optical Testing +22