Frank Cropanese

Approaching the numerical aperture of water immersion lithography at 193-nm

Bruce W. Smith, Anatoly Bourov, Yongfa Fan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 23 citations

Natural Sciences, Materials Engineering, Optical Materials +10

Immersion lithography fluids for high NA 193 nm lithography

Jianming Zhou, Yongfa Fan, Anatoly Bourov et al. · Optical Microlithography XVIII · 2005 · 21 citations

Natural Sciences, Materials Engineering, Materials Science +13

Immersion microlithography at 193 nm with a Talbot prism interferometer

Anatoly Bourov, Yongfa Fan, Frank Cropanese et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 17 citations

Natural Sciences, Electrical Engineering, Microfabrication +12

Water immersion optical lithography for 45-nm node

Bruce W. Smith, Hoyoung Kang, Anatoly Bourov et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 14 citations

Natural Sciences, Materials Science, Optics +9

Hyper NA water immersion lithography at 193nm and 248nm

Bruce W. Smith, Yongfa Fan, Jianming Zhou et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 12 citations

Engineering, Materials Engineering, Biomedical Imaging +6