J.W Lee

Comparison of plasma etch techniques for III–V nitrides

R. J. Shul, G.A. Vawter, C. G. Willison et al. · Solid-State Electronics · 1998 · 53 citations

Natural Sciences, Materials Science, Physics +14

High-density plasma etch selectivity for the III–V nitrides

R. J. Shul, C. G. Willison, M. M. Bridges et al. · Solid-State Electronics · 1998 · 42 citations

Natural Sciences, Materials Engineering, Materials Science +13

Investigation of wet etching solutions for In0.5Ga0.5P

J.W Lee, S. J. Pearton, C. R. Abernathy et al. · Solid-State Electronics · 1995 · 22 citations

Engineering, Materials Engineering, Materials Science +9

Effect of high density H2 plasmas on InGaP/GaAs and AlGaAs/GaAs HEMTs

F. Ren, R. F. Kopf, J. M. Kuo et al. · Solid-State Electronics · 1998 · 19 citations

Engineering, Electrical Engineering, Physics +13

Inductively coupled plasma etching of III–V semiconductors in Cl2-based chemistries

J.W Lee, E. S. Lambers, C. R. Abernathy et al. · Materials Science in Semiconductor Processing · 1998 · 17 citations

Engineering, Materials Engineering, Materials Science +16