M. M. Bridges

Selective inductively coupled plasma etching of group-III nitrides in Cl2- and BCl3-based plasmas

R. J. Shul, C. G. Willison, M. M. Bridges et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 62 citations

Materials Science, Plasma Electronics, Group-iii Nitrides +14

Comparison of plasma etch techniques for III–V nitrides

R. J. Shul, G.A. Vawter, C. G. Willison et al. · Solid-State Electronics · 1998 · 52 citations

Plasma Processing, Plasma Etch Techniques, Applied Physics +1

High-density plasma etch selectivity for the III–V nitrides

R. J. Shul, C. G. Willison, M. M. Bridges et al. · Solid-State Electronics · 1998 · 42 citations

Physics, Applied Physics, Categoryiii-v Semiconductor +2

Origin of the time dependence of wet oxidation of AlGaAs

Carol I. H. Ashby, M. M. Bridges, Andrew A. Allerman et al. · Applied Physics Letters · 1999 · 32 citations · Full text

Materials Science, Materials Engineering, Chemical Engineering +14

GaN Etching in BCl₃/Cl₂ Plasmas

R. J. Shul, Carol I. H. Ashby, C. G. Willison et al. · MRS Proceedings · 1998 · 11 citations

Gan Etching, Plasma Etching, Applied Physics +1