C. G. Willison

Inductively coupled plasma-induced etch damage of GaN p-n junctions

R. J. Shul, L. Zhang, Albert G. Baca et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 98 citations · Full text

Engineering, Electrical Engineering, Physics +17

Growth and fabrication of GaN/AlGaN heterojunction bipolar transistor

Jung Han, Albert G. Baca, R. J. Shul et al. · Applied Physics Letters · 1999 · 87 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Selective inductively coupled plasma etching of group-III nitrides in Cl2- and BCl3-based plasmas

R. J. Shul, C. G. Willison, M. M. Bridges et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 63 citations

Engineering, Materials Engineering, Materials Science +17

Ion energy distributions at rf-biased wafer surfaces

J. R. Woodworth, I. C. Abraham, M. E. Riley et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 55 citations

Natural Sciences, Electrical Engineering, Physics +10

Comparison of plasma etch techniques for III–V nitrides

R. J. Shul, G.A. Vawter, C. G. Willison et al. · Solid-State Electronics · 1998 · 53 citations

Natural Sciences, Materials Science, Physics +14