I. C. Abraham - Concepedia

Author

I. C. Abraham

Sandia National Laboratories

Also Known As

I. Abraham, I. C. Abraham, I. Ábrahám, I.C. Abraham, ION ABRAHAM, Ion C. Abraham

Publications

285

Citations

H-Index

Concepts

All Affiliations

Sandia National Laboratories University of Wisconsin–Madison Johannes Kepler University of Linz

About

I. C. Abraham is an author at Sandia National Laboratories specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	11	269
2	Applied Physics	9	9	245
3	Natural Sciences	3	3	93
4	Chemistry	2	2	71
5	Chemical Engineering	1	1	33

I. C. Abraham

Publications

269

Citations

H-Index

Page 1

	Year	Citations
Ion energy distributions at rf-biased wafer surfaces J. R. Woodworth, I. C. Abraham, M. E. Riley, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Gridded Energy AnalyzerEngineeringRadio FrequencyPlasma SciencePlasma Physics	2002	53
Charged species dynamics in an inductively coupled Ar/SF6 plasma discharge Shahid Rauf, Peter L. G. Ventzek, I. C. Abraham, Journal of Applied Physics EngineeringGlow DischargePlasma SciencePlasma PhysicsSpace Plasma Physics	2002	45
Characterization of electron and negative ion densities in fluorocarbon containing inductively driven plasmas G. A. Hebner, I. C. Abraham Journal of Applied Physics EngineeringGlow DischargeChemistryPlasma ElectronicsPulse Power	2001	38
SiO2 to Si selectivity mechanisms in high density fluorocarbon plasma etching K. H. R. Kirmse, A. Wendt, Sabrina Disch, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringSi Selectivity MechanismsGlow DischargeVacuum DeviceChemistry	1996	33
Absolute densities of long lived species in an ionized physical vapor deposition copper–argon plasma Y. Andrew, I. C. Abraham, John H. Booske, Journal of Applied Physics Optical MaterialsX-ray SpectroscopyEngineeringAbsorption SpectroscopyChemical Deposition	2000	22
Ion energy distributions versus frequency and ion mass at the rf-biased electrode in an inductively driven discharge I. C. Abraham, J. R. Woodworth, M. E. Riley, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringGlow DischargePlasma PhysicsIon ProcessMagnetohydrodynamics	2002	17
Experimental and theoretical study of ion distributions near 300 μm tall steps on rf-biased wafers in high density plasmas J. R. Woodworth, Paul Miller, R. J. Shul, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringPlasma SciencePlasma PhysicsIon FluxesPlasma Theory	2002	14
Mechanical properties of doped cubic zirconia ceramics I. C. Abraham, G. Gritzner Journal of Materials Science Letters Materials ScienceCrystalline CeramicsEngineeringMechanical PropertiesCeramics	1993	13
Surface dependent electron and negative ion density in SF6/argon gas mixtures G. A. Hebner, I. C. Abraham Journal of Applied Physics EngineeringPlasma ScienceNegative Ion DensityPlasma PhysicsPlasma Electronics	2002	12
Powder preparation, mechanical and electrical properties of cubic zirconia ceramics I. C. Abraham, G. Gritzner Journal of the European Ceramic Society Materials SciencePowder ProcessingEngineeringCeramicsCeramic Material	1996	11

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