Peter L. G. Ventzek

Two-dimensional modeling of high plasma density inductively coupled sources for materials processing

Peter L. G. Ventzek, Robert J. Hoekstra, Mark J. Kushner · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 332 citations

High Plasma Density, Two-dimensional Modeling, Engineering +21

Two-dimensional hybrid model of inductively coupled plasma sources for etching

Peter L. G. Ventzek, Timothy J. Sommerer, Robert J. Hoekstra et al. · Applied Physics Letters · 1993 · 156 citations

Engineering, Plasma Physics, Plasma Densities +17

Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling

Peter L. G. Ventzek, Michael Grapperhaus, Mark J. Kushner · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 135 citations

Engineering, Plasma Physics, Plasma Processing +21

Future of plasma etching for microelectronics: Challenges and opportunities

G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2024 · 103 citations · Full text

Materials Science, Electrical Engineering, Digital Twins +14

Dynamics of excimer laser-ablated aluminum neutral atom plume measured by dye laser resonance absorption photography

R. M. Gilgenbach, Peter L. G. Ventzek · Applied Physics Letters · 1991 · 89 citations · Full text

Optical Materials, Dye Laser, Engineering +16