Peter L. G. Ventzek - Concepedia

Author

Peter L. G. Ventzek

Also Known As

Chen, L., P L G Ventzek, P. L. G. Ventzek, P. Ventzek, P.L.G Ventzek, P.L.G. Ventzek, Peter L G Ventzek, Peter L. G. Ventzek, Peter L.G Ventzek, Peter L.G. Ventzek

216

Publications

2.4K

Citations

H-Index

107

Concepts

All Affiliations

Tokyo Electron (Japan)University of Michigan The University of Texas at Austin Motorola (United States)Sarov Institute of Physics and Technology

About

Peter L. G. Ventzek is an author at Tokyo Electron (Japan) specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	25	40	2K
2	Applied Physics	23	35	1.9K
3	Natural Sciences	10	11	466
4	Chemical Engineering	6	6	123
5	Management	1	1	73

Peter L. G. Ventzek

Publications

2.1K

Citations

H-Index

Page 1

	Year	Citations
Two-dimensional modeling of high plasma density inductively coupled sources for materials processing Peter L. G. Ventzek, Robert J. Hoekstra, Mark J. Kushner Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena High Plasma DensityTwo-dimensional ModelingEngineeringPlasma SciencePlasma Physics	1994	332
Two-dimensional hybrid model of inductively coupled plasma sources for etching Peter L. G. Ventzek, Timothy J. Sommerer, Robert J. Hoekstra, Applied Physics Letters EngineeringPlasma PhysicsPlasma DensitiesPlasma ProcessingTwo-dimensional Hybrid Model	1993	156
Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling Peter L. G. Ventzek, Michael Grapperhaus, Mark J. Kushner Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringPlasma PhysicsPlasma ProcessingCylindrical Plasma ChamberPlasma Electronics	1994	135
Future of plasma etching for microelectronics: Challenges and opportunities G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena Materials ScienceElectrical EngineeringDigital TwinsEngineeringPlasma Electronics	2024	103
Dynamics of excimer laser-ablated aluminum neutral atom plume measured by dye laser resonance absorption photography R. M. Gilgenbach, Peter L. G. Ventzek Applied Physics Letters Optical MaterialsDye LaserEngineeringAtomic Emission SpectroscopyLaser Applications	1991	89
A molecular dynamics investigation of fluorocarbon based layer-by-layer etching of silicon and SiO2 Shahid Rauf, T. Sparks, Peter L. G. Ventzek, Journal of Applied Physics EngineeringIntegrated CircuitsChemistrySilicon On InsulatorSemiconductors	2007	86
Laser beam deflection as a probe of laser ablation of materials Jeffrey A. Sell, David M. Heffelfinger, Peter L. G. Ventzek, Applied Physics Letters Optical MaterialsEngineeringLaser Fluence ThresholdLaser ApplicationsLaser Physics	1989	81
2022 Review of Data-Driven Plasma Science Rushil Anirudh, M. Salman Asif, Markus M. Becker, IEEE Transactions on Plasma Science Artificial IntelligenceEngineeringPlasma SciencePlasma PhysicsSpace Plasma Physic	2023	73
Photoacoustic and photothermal beam deflection as a probe of laser ablation of materials Jeffrey A. Sell, David M. Heffelfinger, Peter L. G. Ventzek, Journal of Applied Physics Optical MaterialsEngineeringLaser PhysicsLaser ApplicationsLaser Ablation	1991	67
Model for an inductively coupled Ar/c-C4F8 plasma discharge Shahid Rauf, Peter L. G. Ventzek Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Electron DensityElectrical EngineeringEngineeringC-c4f8 PlasmaGlow Discharge	2002	65

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