Robert J. Hoekstra

An overview of the Trilinos project

Michael A. Heroux, Roscoe Bartlett, Vicki E. Howle et al. · ACM Transactions on Mathematical Software · 2005 · 1.1K citations

Computing, Computer Science, Computational Physics +15

Two-dimensional modeling of high plasma density inductively coupled sources for materials processing

Peter L. G. Ventzek, Robert J. Hoekstra, Mark J. Kushner · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 338 citations

Natural Sciences, Electrical Engineering, Physics +17

Two-dimensional hybrid model of inductively coupled plasma sources for etching

Peter L. G. Ventzek, Timothy J. Sommerer, Robert J. Hoekstra et al. · Applied Physics Letters · 1993 · 161 citations

Natural Sciences, Materials Science, Physics +16

Microtrenching resulting from specular reflection during chlorine etching of silicon

Robert J. Hoekstra, Mark J. Kushner, Valeriy Sukharev et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 109 citations

Natural Sciences, Materials Science, Physics +16

Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors

Robert J. Hoekstra, Mark J. Kushner · Journal of Applied Physics · 1996 · 96 citations

Natural Sciences, Electrical Engineering, Physics +14