A. Wendt - Concepedia

Author

A. Wendt

University of Wisconsin–Madison

Also Known As

A E Wendt, A Wendt, A. E. Wendt, A. WENDT, A. Wendt, A.E. Wendt, Amy E Wendt, Amy E. Wendt, Amy Wendt, Anne Wendt

198

Publications

3.5K

Citations

H-Index

Concepts

All Affiliations

University of Wisconsin–Madison GSI Helmholtz Centre for Heavy Ion Research University of Cologne Technical University of Darmstadt Lund University

About

A. Wendt is an author at University of Wisconsin–Madison specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	25	46	2K
2	Applied Physics	23	40	1.6K
3	Natural Sciences	13	15	580
4	Chemical Engineering	2	2	125
5	Biomedical Engineering	1	1	46

A. Wendt

Publications

2.4K

Citations

H-Index

Page 1

	Year	Citations
Control of ion energy distribution at substrates during plasma processing S.-B. Wang, A. Wendt Journal of Applied Physics Electrical EngineeringPlasma ElectronicsEngineeringNarrower IedfNarrow Iedf	2000	165
Measurement of metastable and resonance level densities in rare-gas plasmas by optical emission spectroscopy John B. Boffard, Robert Jung, Chun C. Lin, Plasma Sources Science and Technology EngineeringAtomic Emission SpectroscopyOptical Emission SpectroscopyPlasma SciencePlasma Physics	2009	122
Yrast 6(+) Seniority Isomers of Sn-136,Sn-138 G. S. Simpson, G. Gey, A. Jungclaus, Kölner Universitäts PublikationsServer (Universität zu Köln)	2014	122
Electron-density and energy distributions in a planar inductively coupled discharge Leonard J. Mahoney, A. Wendt, Ernesto L. Barrios, Journal of Applied Physics EngineeringGlow DischargePlasma SciencePlasma PhysicsEnergy Distributions	1994	117
Optical emission measurements of electron energy distributions in low-pressure argon inductively coupled plasmas John B. Boffard, Robert Jung, Chun C. Lin, Plasma Sources Science and Technology EngineeringPlasma ScienceElectron Energy DistributionsPlasma PhysicsEedf Shapes	2010	109
Radial current distribution at a planar magnetron cathode A. Wendt, M. A. Lieberman, H. Meuth Journal of Vacuum Science & Technology A Vacuum Surfaces and Films MagnetismElectrical EngineeringEngineeringPhysicsGlow Discharge	1988	102
Sub‐micron and nanoscale feature depth modulates alignment of stromal fibroblasts and corneal epithelial cells in serum‐rich and serum‐free media Sarah Fraser, Yuk‐Hong Ting, Kelly S. Mallon, Journal of Biomedical Materials Research Part A	2007	101
Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography Yuk Hong Ting, Sang-Min Park, Chi‐Chun Liu, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceChemical EngineeringBlock Copolymer LithographyEngineeringBlock Co-polymers	2008	92
Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching Yuk‐Hong Ting, Chi-Chun Liu, Sangmin Park, Polymers EngineeringPlasma ProcessingMethyl MethacrylateNanolithography MethodPolymer Chemistry	2010	84
Arbitrary substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing M. Patterson, H-Y Chu, A. Wendt Plasma Sources Science and Technology Electrical EngineeringPlasma ElectronicsEngineeringPhysicsArbitrary Substrate Voltage	2007	71

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