Hiroyuki Shigemura

Selete's EUV program: progress and challenges

Ichiro Mori, Osamu Suga, Iwao Nishiyama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 50 citations

Engineering, Lithography Design, Lithography Integration +18

Development of new FIB technology for EUVL mask repair

Fumio Aramaki, Takashi Ogawa, Osamu Matsuda et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 31 citations

Materials Science, Ion Implantation, Engineering +14

Repair specification study for half-pitch 32-nm patterns for EUVL

Hajime Aoyama, Tsuyoshi Amano, Yasushi Nishiyama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 17 citations

Repair Specification Study, Engineering, Electron-beam Lithography +22

Study of EUV mask inspection technique using DUV light source for hp22nm and beyond

Ryoichi Hirano, Nobutaka Kikuiri, H Hashimoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 17 citations

Engineering, Electron-beam Lithography, Optical Testing +16

Study of EUVL mask defect repair using FIB-GAE method

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 12 citations

Materials Science, Fib-gae Method, Ion Implantation +10