Toshio Sakamizu

Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists

Taku Hirayama, Daiju Shiono, Shogo Matsumaru et al. · Japanese Journal of Applied Physics · 2005 · 39 citations

Materials Science, Chemical Engineering, Engineering +14

Nanometer-scale imaging characteristics of novolak resin-based chemical amplification negative resist systems and molecular weight distribution effects of the resin matrix

Hiroshi Shiraishi, Toshiyuki Yoshimura, Toshio Sakamizu et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 37 citations

Materials Engineering, Materials Science, Focused Electron Beam +13

Stimulated emission of near-infrared radiation by current injection into silicon (100) quantum well

Shinichi Saito, Yuji Suwa, H. Arimoto et al. · Applied Physics Letters · 2009 · 32 citations · Full text

Photonics, Electrical Engineering, Photoluminescence +14

Acid-Catalyzed Reactions of Tetrahydropyranyl-Protected Polyvinylphenol in a Novolak-Resin-Based Positive Resist

Toshio Sakamizu, Hiroshi Shiraishi, Hidenori Yamaguchi et al. · Japanese Journal of Applied Physics · 1992 · 18 citations

Organic Material Chemistry, Chemical Engineering, Engineering +14

Novolak resin-based positive electron-beam resist system utilizing acid-sensitive polymeric dissolution inhibitor with solubility reversal reactivity

Hiroshi Shiraishi, Nobuaki Hayashi, Takumi Ueno et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 12 citations

Engineering, Responsive Polymers, Organic Chemistry +16