Determination of acid diffusion in chemical amplification positive deep ultraviolet resists

Leo Schlegel, Takumi Ueno, Nobuaki Hayashi, +1

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringChemistryChemical EngineeringBeam LithographyAnalytical Chemistry +16

A Novel Water-Soluble Photoinitiator for the Acrylic Photopolymerization Type Resist System

K. Kojima, Masato Ito, Hajime Morishita, +1

Chemistry of Materials

Tetrahydropyranyl‐ and furanyl‐protected polyhydroxystyrene in chemical amplification systems

Simon A.M. Hesp, Nobuaki Hayashi, Takumi Ueno

Journal of Applied Polymer Science

Modification of bismaleimide resin by soluble poly(ester imide) containing trimellitimide moieties

Takao Iijima, Nobuaki Hayashi, Toshiyuki Ōyama, +1

Polymer International

Bismaleimide ResinEngineeringEster ImideOrganic ChemistryChemistry +18

Synthesis of Pyrrole Derivatives from 5,6-Dihydro-4<i>H</i>-1,2-oxazines via Reductive Deoxygenation by Use of Fe3(CO)12

Saburo Nakanishi, Yoshio Otsuji, Keiji Itoh, +1

Bulletin of the Chemical Society of Japan

Hollowing and Transfer of Polymethyl Methacrylate Film Propelled by Laser Ablation of Triazeno Polymer Film

Takashi Mito, Takuji Tsujita, Hiroshi Masuhara, +2

Japanese Journal of Applied Physics

Optical MaterialsEngineeringMechanical EngineeringLaser ApplicationsLaser Ablation +18

&lt;title&gt;Excimer ablation lithography (EAL) for TFT-LCD&lt;/title&gt;

Kenkichi Suzuki, Masaaki Matsuda, T. Ogino, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Direct PatterningOptical EngineeringEngineeringElectron-beam LithographyMicroscopy +14

Laser-induced decomposition and ablation dynamics studied by nanosecond interferometry

Tomokazu Masubuchi, Hiroshi Fukumura, Hiroshi Masuhara, +2

Journal of Photochemistry and Photobiology A Chemistry

EngineeringPhysicsOptical PropertiesSpectroscopyNatural Sciences +6

Dissolution Behavior of Novolak/Dissolution Inhibitor Resist Systems in an Aqueous Base Developer

Leo Schlegel, Takumi Ueno, Hiroshi Shiraishi, +3

Japanese Journal of Applied Physics

Novolak TypeDissolution Inhibition CapabilitiesBioorganic ChemistryEngineeringGreen Chemistry +14

Polymer resist materials for excimer ablation lithography

Kenkichi Suzuki, Masaaki Matsuda, Nobuaki Hayashi

Applied Surface Science

Materials ScienceEngineeringBeam LithographyPolymer ScienceApplied Physics +3