Reactive ion etching of InP using CH4/H2 mixtures: Mechanisms of etching and anisotropy

Todd R. Hayes, M. Dreisbach, W. C. Dautremont–Smith, +1

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Significant Hydrocarbon FilmEngineeringElectron-beam LithographyHydrocarbon CoverageChemistry +17

Investigation of carbon incorporation in GaAs using13C-enriched trimethylarsenic and13Ch4

R. M. Lum, J. K. Klingert, D. W. Kisker, +5

Journal of Electronic Materials

Materials EngineeringSemiconductorsEngineeringApplied PhysicsCarbon Incorporation +1

Fluorescence from the 1 1<i>B</i> <i>u</i> state of <i>t</i> <i>r</i> <i>a</i> <i>n</i> <i>s</i>,<i>t</i> <i>r</i> <i>a</i> <i>n</i> <i>s</i>-1,3,5,7-octatetraene in a free jet

L. A. Heimbrook, Bryan E. Kohler, Irvin J. Levy

The Journal of Chemical Physics

EngineeringChemistryElectronic Excited StatePhosphorescence ImagingExcitation Spectra +18

Free jet excitation and emission spectra of diphenylbutadiene

L. A. Heimbrook, Bryan E. Kohler, Thomas A. Spiglanin

Proceedings of the National Academy of Sciences

Metalorganic chemical vapor deposition of aluminum from trimethylamine alane using Cu and TiN nucleation activators

M. E. Gross, Kin P. Cheung, Cass Fleming, +2

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Aluminium NitrideEngineeringAl DepositionTicl4 ActivationThin Film Process Technology +16

Dual fluorescence excitation spectra of methyl salicylate in a free jet

L. A. Heimbrook, Jonathan E. Kenny, Bryan E. Kohler, +1

The Journal of Chemical Physics

Free-jet ExpansionEngineeringAbsorption SpectroscopyChemistryPhosphorescence Imaging +15

Free-jet fluorescence excitation spectrum of <i>t</i> <i>r</i> <i>a</i> <i>n</i> <i>s</i>, <i>t</i> <i>r</i> <i>a</i> <i>n</i> <i>s</i>-1,3,5,7-octatetraene

L. A. Heimbrook, Jonathan E. Kenny, Bryan E. Kohler, +1

The Journal of Chemical Physics

EngineeringExcitation Energy TransferChemistryElectronic Excited StateSpectra-structure Correlation +15

Liquid source metalorganic chemical vapor deposition of aluminum from triethylamine alane

M. E. Gross, Cass Fleming, Kin P. Cheung, +1

Journal of Applied Physics

Materials ScienceAdduct PrecursorsChemical EngineeringEngineeringTriethylamine Alane +9

Production of clusters by laser vaporization and their trapping in rare gas matrices

L. A. Heimbrook, Markku Räsänen, V. E. Bondybey

The Journal of Physical Chemistry

EngineeringChemical AnalysisLaser ApplicationsAltmetric Attention ScoreRare Gas Matrices +16

Heterointerface stability in GaAs-on-Si grown by metalorganic chemical vapor deposition

S. J. Pearton, D. L. Malm, L. A. Heimbrook, +5

Applied Physics Letters

EngineeringSemiconductor MaterialsSi DiffusionOptoelectronic DevicesIntegrated Circuits +15